STRUCTURAL DETERMINATION OF CRYSTALLINE SILICON BY EXTENDED ENERGY-LOSS FINE-STRUCTURE SPECTROSCOPY

被引：54

作者：

DECRESCENZI, M

LOZZI, L

PICOZZI, P

SANTUCCI, S

BENFATTO, M

NATOLI, CR

机构：

[1] UNIV AQUILA,DEPARTIMENTO FIS,I-67100 AQUILA,ITALY

[2] IST NAZL FIS NUCL,LAB NAZL FRASCATI,I-00044 FRASCATI,ITALY

来源：

PHYSICAL REVIEW B | 1989年 / 39卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.39.8409

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：8409 / 8422

页数：14

共 40 条

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[6] SYSTEMATIC-APPROACH TO THE CALCULATION OF THE POLARIZATION-DEPENDENT (AND POLARIZATION-AVERAGED) GENERAL TERM OF THE CURVED-WAVE MULTIPLE-SCATTERING SERIES IN THE X-RAY-ABSORPTION CROSS-SECTION
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[9] EXTENDED FINE-STRUCTURES ABOVE TI L2,3 EDGE - A COMPARISON BETWEEN REFLECTION ENERGY-LOSS AND EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE RESULTS
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