ELECTROCHEMICAL AND CHEMICAL-REACTIONS OF HYPOBROMITE AT GAAS ELECTRODES

被引：12

作者：

MINKS, BP

WIEGEL, M

KELLY, JJ

机构：

[1] Debye Research Institute, University of Utrecht, 3508 TA Utrecht

来源：

ELECTROCHIMICA ACTA | 1991年 / 36卷 / 3-4期

关键词：

CURRENT-DOUBLING; ETCHING; HYPOBROMITE; HYPOCHLORITE; REDUCTION; RECOMBINATION; GAAS;

D O I：

10.1016/0013-4686(91)85160-9

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 [应用化学];

摘要：

The electrochemical and chemical reactions of BrO- at GaAs in alkaline solutions, studied in this work, show a strong resemblance to results previously reported for alkaline ClO- and acidic Br2 and H2O2 systems. Common features of all these systems include cathodic reduction via a current doubling mechanism and a coupled chemical etching by the oxidizing agent. Recombination impedance measurements lead to the conclusion that the unified model involving a common precursor for etching and reduction reactions, proposed for symmetrical oxidizing agents, can also be applied to the asymmetrical agents ClO- and BrO-.

引用

页码：695 / 701

页数：7

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[2]

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