DIPOLAR INTERACTION AND ITS INTERPLAY WITH INTERFACE ROUGHNESS

被引:41
作者
ALTBIR, D
KIWI, M
RAMIREZ, R
SCHULLER, IK
机构
[1] UNIV CALIF SAN DIEGO, DEPT PHYS, LA JOLLA, CA 92093 USA
[2] PONTIFICIA UNIV CATOLICA CHILE, FAC FIS, SANTIAGO 22, CHILE
关键词
D O I
10.1016/0304-8853(95)00292-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a comparison of the strength of the classical dipolar interaction, relative to quantum-mechanical coupling mechanisms like RKKY and complete confinement, between two ferromagnetic films separated by a paramagnetic spacer. The classical dipolar coupling, which vanishes if the two interfaces are perfectly continuous and flat, builds up strength as the interface roughness grows for several models of interface topography. These numerical estimates, carried out for a Co/Cu/Co trilayer show that, in the presence of substantial surface roughness, the dipole-dipole interaction strength is comparable, and at times even larger, than those obtained using other well established mechanisms. These results are also in qualitative agreement with experimental measurements in a variety of multilayer systems. Thus, for rough interfaces, the dipolar interaction cannot be ignored.
引用
收藏
页码:L246 / L250
页数:5
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