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UNDERPOTENTIAL DEPOSITION OF METALS ON FOREIGN METAL SUBSTRATES

被引：132
作者：
SZABO, S
机构：
[1] Central Research Institute of Chemistry, Hungarian Academy of Sciences, H-1525 Budapest
来源：
INTERNATIONAL REVIEWS IN PHYSICAL CHEMISTRY | 1991年 / 10卷 / 02期
基金：
匈牙利科学研究基金会;
关键词：
D O I：
10.1080/01442359109353258
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The underpotential deposition of metals on foreign metal substrates has been reviewed, but this term is used in a wider sense in this monograph. All the redox processes resulting in adsorbed metal atoms on foreign metal substrates are included in this term. Based on the source of electrons taking part in the underpotential deposition, the classification of the processes leading to adsorbed metal atoms is also given.
引用
收藏
页码：207 / 248
页数：42
相关论文
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