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NON-DESTRUCTIVE MEASUREMENT OF GLASS ON SILICON DIOXIDE THROUGH NEAR-INFRARED (NIR) INTERFERENCE
被引:8
作者
:
CORL, EA
论文数:
0
引用数:
0
h-index:
0
CORL, EA
KOSANKE, K
论文数:
0
引用数:
0
h-index:
0
KOSANKE, K
机构
:
来源
:
SOLID-STATE ELECTRONICS
|
1966年
/ 9卷
/ 10期
关键词
:
D O I
:
10.1016/0038-1101(66)90070-0
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:943 / &
相关论文
共 5 条
[1]
THICKNESS MEASUREMENT OF SILICON DIOXIDE LAYERS BY ULTRAVIOLET-VISIBLE INTERFERENCE METHOD
[J].
CORL, EA
论文数:
0
引用数:
0
h-index:
0
CORL, EA
;
WIMPFHEIMER, H
论文数:
0
引用数:
0
h-index:
0
WIMPFHEIMER, H
.
SOLID-STATE ELECTRONICS,
1964,
7
(10)
:755
-&
[2]
PLISKIN W, REFRACTIVE INDEX SIO
[3]
NONDESTRUCTIVE DETERMINATION OF THICKNESS + REFRACTIVE INDEX OF TRANSPARENT FILMS
[J].
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
;
CONRAD, EE
论文数:
0
引用数:
0
h-index:
0
CONRAD, EE
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(01)
:43
-&
[4]
INTERFERENCE METHOD FOR MEASURING THICKNESS OFEPITAXIALLY GROWN FILMS
[J].
SPITZER, WG
论文数:
0
引用数:
0
h-index:
0
SPITZER, WG
;
TANENBAUM, M
论文数:
0
引用数:
0
h-index:
0
TANENBAUM, M
.
JOURNAL OF APPLIED PHYSICS,
1961,
32
(04)
:744
-&
[5]
1964, 9909483 PERK ELM CO
←
1
→
共 5 条
[1]
THICKNESS MEASUREMENT OF SILICON DIOXIDE LAYERS BY ULTRAVIOLET-VISIBLE INTERFERENCE METHOD
[J].
CORL, EA
论文数:
0
引用数:
0
h-index:
0
CORL, EA
;
WIMPFHEIMER, H
论文数:
0
引用数:
0
h-index:
0
WIMPFHEIMER, H
.
SOLID-STATE ELECTRONICS,
1964,
7
(10)
:755
-&
[2]
PLISKIN W, REFRACTIVE INDEX SIO
[3]
NONDESTRUCTIVE DETERMINATION OF THICKNESS + REFRACTIVE INDEX OF TRANSPARENT FILMS
[J].
PLISKIN, WA
论文数:
0
引用数:
0
h-index:
0
PLISKIN, WA
;
CONRAD, EE
论文数:
0
引用数:
0
h-index:
0
CONRAD, EE
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1964,
8
(01)
:43
-&
[4]
INTERFERENCE METHOD FOR MEASURING THICKNESS OFEPITAXIALLY GROWN FILMS
[J].
SPITZER, WG
论文数:
0
引用数:
0
h-index:
0
SPITZER, WG
;
TANENBAUM, M
论文数:
0
引用数:
0
h-index:
0
TANENBAUM, M
.
JOURNAL OF APPLIED PHYSICS,
1961,
32
(04)
:744
-&
[5]
1964, 9909483 PERK ELM CO
←
1
→