SIMPLIFIED HIGH-EFFICIENCY SILICON CELL PROCESSING

被引:12
作者
BASORE, PA
GEE, JM
BUCK, ME
SCHUBERT, WK
RUBY, DS
机构
[1] Sandia National Laboratories, Photovoltaic System Components Dept., Dept. 6213, Albuquerque
关键词
D O I
10.1016/0927-0248(94)90028-0
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
We developed an emitter diffusion process that yields a near-ideal doping profile with a passivating oxide in a single furnace step. Because this process subjects the material to only one high-temperature thermal excursion, bulk lifetime is better preserved. This is especially true for lower-cost silicon materials containing a high concentration of oxygen or carbon. Using this process, we routinely obtain one-sun cell efficiencies over 19% on float-zone material and over 18% on Czochralski material. Using solar-grade Czochralski material, we have demonstrated record efficiencies of 18.3% at one sun and 20.0% under concentration. Simple processes that yield high-performance diffusion profiles are expected to become increasingly important as manufacturers adopt improved techniques for ohmic contacts.
引用
收藏
页码:91 / 100
页数:10
相关论文
共 6 条
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Basore P.A., 1990, 21 IEEE PHOT SPEC C, P374
[2]  
COPPYE J, 1991, 22ND P IEEE PVC LAS, P1020
[3]  
GEE JM, 1993, 23RD IEEE PHOT SPEC
[4]  
KING DL, 1991, 22 IEEE PHOT SPEC C, P303
[5]  
RUBY DS, 1993, 23RD IEEE PHOT SPEC
[6]  
Wenham S. R., 1993, PROG PHOTOVOLTAICS, V1, P3, DOI DOI 10.1002/PIP.4670010102