TRANSMISSION ELECTRON-MICROSCOPY STUDY OF CROSS-SECTION MICROSTRUCTURES OF MAGNETRON SPUTTER ION-PLATED AL FILMS ON NI SUBSTRATE

被引：2

作者：

WAN, LJ ^{[1
]}

KUO, KH ^{[1
]}

机构：

[1] CHINESE ACAD SCI,BEIJING LAB ELECTRON MICROSCOPY,BEIJING,PEOPLES R CHINA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 04期

关键词：

D O I：

10.1116/1.575773

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2678 / 2680

页数：3

共 8 条

[1] MORPHOLOGY OF ION-PLATED TITANIUM AND ALUMINUM FILMS DEPOSITED AT VARIOUS SUBSTRATE TEMPERATURES [J].

LARDON, M ;

BUHL, R ;

SIGNER, H ;

PULKER, HK ;

MOLL, E .

THIN SOLID FILMS, 1978, 54 (03) :317-322

[2] INTERFACE FORMATION DURING THIN FILM DEPOSITION [J].

MATTOX, DM ;

MCDONALD, JE .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) :2493-&

[3]

MATTOX DM, 1964, ELECTROCHEM TECHNOL, V2, P259

[4]

MATTOX DM, 1974, JPN J APPL PHYS S2, V2, P443

[5]

MATTOX DM, 1964, ELECTROCHEM TECHNOL, V9, P295

[6] ION-PLATED METAL CERAMIC INTERFACES [J].

RIGSBEE, JM ;

SCOTT, PA ;

KNIPE, RK ;

JU, CP ;

HOCK, VF .

VACUUM, 1986, 36 (1-3) :71-74

[7] GRAIN STRUCTURE OF ION-PLATED COATINGS [J].

TEER, DG ;

DELCEA, BL .

THIN SOLID FILMS, 1978, 54 (03) :295-301

[8] INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS [J].

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :666-670

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