SUPERPOLISHED SILICON-CARBIDE MIRROR FOR HIGH-POWER OPERATION OF EXCIMER LASERS IN A VACUUM ULTRAVIOLET SPECTRAL RANGE

被引：23

作者：

KUROSAWA, K

SASAKI, W

OKUDA, M

TAKIGAWA, Y

YOSHIDA, K

FUJIWARA, E

KATO, Y

机构：

[1] OSAKA ELECTROCOMMUN UNIV,DEPT SOLID STATE ELECTR,NEYAGAWA,OSAKA 572,JAPAN

[2] OSAKA UNIV,INST LASER ENGN,SUITA,OSAKA 565,JAPAN

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1990年 / 61卷 / 02期

关键词：

D O I：

10.1063/1.1141485

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We demonstrate the usefulness of a high-quality SiC mirror for the high-power operation of vacuum ultraviolet lasers. A void free SiC film of 400-μm thickness was deposited onto a high-purity graphite substrate by chemical vapor deposition. The super-polished SiC mirror, whose surface roughness was 0.2 nm rms, was used as a cavity reflector of a high-power Ar excimer laser, which operates at 126 nm. The highest output energy of 400 mJ/cm2 per pulse, which corresponds to the energy density of 1 J/cm2 on the SiC mirror surface, has been obtained without any damage to the SiC mirrors.

引用

页码：728 / 731

页数：4

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