HETEROEPITAXIAL GROWTH OF KCL AND LIF ON A CLEAVED (001) FACE OF KBR

被引：38

作者：

SAIKI, K

NAKAMURA, Y

KOMA, A

机构：

[1] Department of Chemistry, The University of Tokyo, Tokyo

来源：

SURFACE SCIENCE | 1991年 / 250卷 / 1-3期

关键词：

ALKALI-HALIDES; EPITAXY;

D O I：

10.1016/0039-6028(91)90706-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An initial stage of heteroepitaxial growth of KCl and LiF on a KBr substrate was studied using RHEED, EELS and AES. Both KCl and LiF films grow heteroepitaxially on a KBr substrate with their crystallographic axes parallel to that of substrate. In the case of KCl growth occurs in a well ordered layer-by-layer fashion and it is found that thickness of an intermediate region between KCl and KBr is less than 2 nm. In contrast three-dimensional island growth occurs in the case of LiF. Differences in lattice mismatch and solid solubility seem to determine the mechanism of heteroepitaxy of KCl and LiF on a KBr substrate.

引用

页码：27 / 32

页数：6

共 11 条

[1]

KLAUSER R, 1990, JAPAN SOC APPLIED PH, V3, P1100

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