DEPOSITION OF THIN FILMS OF ENRICHED URANIUM DIOXIDE

被引：1

作者：

BACIARELLI, RM

机构：

来源：

NUCLEAR APPLICATIONS | 1966年 / 2卷 / 06期

关键词：

D O I：

10.13182/NT66-A27539

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：471 / +

页数：1

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