ANALYTICAL REPRESENTATION OF SPOT DIAGRAMS AND ITS APPLICATION TO THE DESIGN OF MONOCHROMATORS

被引:23
作者
NAMIOKA, T [1 ]
KOIKE, M [1 ]
机构
[1] LAWRENCE BERKELEY LAB,CTR X RAY OPT,BERKELEY,CA 94720
基金
美国国家航空航天局;
关键词
D O I
10.1016/0168-9002(92)90557-K
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A new method has been developed for the design of a highly sophisticated Monochromator equipped with a holographic or a ruled grating with variable spacing and curved grooves. The method utilizes analytical expression of the spot diagrams, as well as a merit function which closely represents the rms spread of the spots formed when an infinite number of rays are traced. Unlike other design methods based on the light path function, the present method takes into account all the possible aberrations (up to third order) in spectral images, the ruled area, and the slit height. Also given are design examples of a high-resolution VUV monochromator.
引用
收藏
页码:219 / 227
页数:9
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