THERMAL NITRIDATION OF SI AND SIO2 FOR VLSI

被引：153

作者：

MOSLEHI, MM

SARASWAT, KC

机构：

来源：

关键词：

D O I：

10.1109/T-ED.1985.21920

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：106 / 123

页数：18

共 62 条

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[2]

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[7]

Chang T. T. L., 1982, International Electron Devices Meeting. Technical Digest

[8]

CHEN J, 1984, ECS M

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DEAL, BE ;

GROVE, AS .

[10]

Ekstedt T. W., 1983, Insulating Films on Semiconductors. Proceedings of the International Conference INFOS 83, P189