GAS-ADSORPTION ON MICROPOROUS CARBON THIN-FILMS

被引：6

作者：

OSHEA, S ^{[1
]}

PAILTHORPE, BA ^{[1
]}

COLLINS, RE ^{[1
]}

FURLONG, DN ^{[1
]}

机构：

[1] UNIV SYDNEY,DEPT APPL PHYS,SYDNEY,NSW 2006,AUSTRALIA

来源：

LANGMUIR | 1992年 / 8卷 / 05期

关键词：

D O I：

10.1021/la00041a029

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A gas adsorption study was performed on amorphous hydrogenated carbon thin films which are deposited by reactive magnetron sputtering using acetylene gas. It is found that the films are highly microporous. Annealing significantly increases the adsorption capacity of the films and decreases the effects of low-pressure hysteresis in the adsorption isotherms. The general gas adsorption behavior closely resembles that of powdered activated carbons. The Dubinin-Radushkevich equation can be used to model the submonolayer adsorption isotherm for a variety of gases.

引用

页码：1417 / 1424

页数：8

共 38 条

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BERINGTON PR, 1969, DATA REDUCTION ERROR

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