LOCAL-STRUCTURE OF DIAMOND FILMS - AUGER AND EELFS INVESTIGATION

被引：7

作者：

TERRANOVA, ML ^{[1
]}

SESSA, V ^{[1
]}

BERNARDINI, R ^{[1
]}

DAVOLI, I ^{[1
]}

DECRESCENZI, M ^{[1
]}

机构：

[1] UNIV CAMERINO, DIPARTIMENTO MATEMAT & FIS, I-62032 CAMERINO, ITALY

来源：

SURFACE SCIENCE | 1995年 / 331卷

关键词：

CHEMICAL VAPOR DEPOSITION; DIAMOND; ELECTRON ENERGY LOSS SPECTROSCOPY; POLYCRYSTALLINE THIN FILMS;

D O I：

10.1016/0039-6028(95)00266-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A series of diamond films deposited on Si(100) wafers by chemical vapour deposition (CVD) from methane/hydrogen mixtures has been analyzed using different electron spectroscopies. Auger electron spectra allowed evaluation of the filled density of states of the films in terms of pi and sigma valence bands. They have been correlated to the graphite content of diamond films by comparison with the Auger spectrum taken from a sample of highly oriented pyrolitic graphite (HOPG). The pi* and sigma* features detected in the K-edge electron energy loss spectra have been used to evaluate the sp(2)/sp(3) ratio. The extended energy loss fine structure (EELFS) spectra provide information on the local structural order of the deposits. The Fourier transforms of the EELFS indicate a sizable decrease of the interplanar distances of the carbon atoms in diamond films compared to the HOPG sample.

引用

页码：1050 / 1055

页数：6

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