STRUCTURE OF SPUTTERED NI2P FILMS

被引：5

作者：

SCHREY, F

BOONE, T

NAKAHARA, S

ROBBINS, M

APPELBAUM, A

机构：

[1] AT&T Bell Lab, Murray Hill, NJ,, USA, AT&T Bell Lab, Murray Hill, NJ, USA

来源：

THIN SOLID FILMS | 1987年 / 149卷 / 03期

关键词：

MICROSCOPIC EXAMINATION - Transmission Electron Microscopy - NICKEL COMPOUNDS - Thin Films - SPUTTERING - SUBSTRATES - Thermal Conductivity - X-RAYS - Diffraction;

D O I：

10.1016/0040-6090(87)90393-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Crystalline and amorphous nickel phosphide (Ni//2P) films are grown by d. c. magnetron sputtering onto various substrate materials, including silicon, III-V compound semiconductors, glass and metals (copper and aluminum). X-ray diffraction and transmission electron microscopy studies showed that the film structure changes most sensitively with the thermal conductivity of the substrates.

引用

页码：303 / 311

页数：9