THE RADICAL CATION - FORMATION IN THE SECONDARY ION MASS-SPECTROMETRY PROCESS

被引：11

作者：

SHORT, RD ^{[1
]}

DAVIES, MC ^{[1
]}

机构：

[1] UNIV NOTTINGHAM,SCH PHARM,NOTTINGHAM NG7 2RD,ENGLAND

来源：

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES | 1989年 / 89卷 / 2-3期

关键词：

D O I：

10.1016/0168-1176(89)83057-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

引用

页码：149 / 155

页数：7

共 14 条

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[10] TOF-SIMS ANALYSIS OF THE SURFACE OF INSULATORS - EXAMPLES OF CHEMICALLY MODIFIED POLYMERS AND GLASS
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