PULSE DISCHARGE CLEANING FOR OPEN-ENDED SYSTEMS

被引:2
作者
GARNER, HR [1 ]
AOKI, T [1 ]
机构
[1] NAGOYA UNIV,INST PLASMA PHYS,RFC-XX-M TANDEM MIRROR GRP,NAGOYA,AICHI 464,JAPAN
来源
FUSION TECHNOLOGY | 1986年 / 9卷 / 03期
关键词
PLASMAS - Physical Properties;
D O I
10.13182/FST86-A24734
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
A significant improvement in plasma parameters (ion temperature and electon temperature) has been achieved through the use of pulse discharge cleaning in the mirror machine, RFC-XX-M, in Nagoya, Japan. The essence of this technique is to use pulsed-off-resonance ion cyclotron heating (10-ms duration every 10 s), gas puffing, and electron cyclotron heating preionization in conjuction with baking (to 100 to 150 degree C) in order to prepare the machine surfaces for full-power normal experimental shots. It was also found that RFC-XX-M could operate at nearly full parameters without titanium gettering after discharge cleaning, whereas without discharge cleaning and titanium gettering it is difficult to sustain a plasma.
引用
收藏
页码:481 / 483
页数:3
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