DIELECTRIC-PROPERTIES OF ELECTRON-BEAM-EVAPORATED ND2O3 THIN-FILMS

被引：45

作者：

DHARMADHIKARI, VS ^{[1
]}

GOSWAMI, A ^{[1
]}

机构：

[1] NATL CHEM LAB,POONA 411008,MAHARASHTRA,INDIA

来源：

关键词：

D O I：

10.1016/0040-6090(82)90266-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：119 / 126

页数：8

共 25 条

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[8] DIELECTRIC PROPERTIES OF AMORPHOUS NB2O5 THIN-FILMS
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[J]. THIN SOLID FILMS, 1975, 30 (01) : 145 - 154
[9] GEVERS M, 1946, PHILIPS RES REP, V11, P279
[10] AC BEHAVIOR OF VACUUM-DEPOSITED PRASEODYMIUM OXIDE-FILMS
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