PHOTOCHEMISTRY OF METALAXYL

被引：25

作者：

SUKUL, P

MOZA, PN

HUSTERT, K

KETTRUP, A

机构：

[1] GSF,INST OKOL CHEM,SCHULSTR 10,W-8050 FREISING,GERMANY

[2] BCKV,DEPT AGR CHEM & SOIL SCI,MOHANPUR 741252,W BENGAL,INDIA

来源：

JOURNAL OF AGRICULTURAL AND FOOD CHEMISTRY | 1992年 / 40卷 / 12期

关键词：

D O I：

10.1021/jf00024a029

中图分类号：

S [农业科学];

学科分类号：

09 ;

摘要：

The photolysis of the fungicide metalaxyl in aqueous solution has been examined. Irradiation at 254 and 290 nm resulted, respectively, in 53 and 10 % substrate transformation in 3 h. Long-time (65 h) irradiation under artificial sunlight in the presence of commercially available humic acid resulted in 65 % degradation of the chemical. The photolysis leads not only to rearrangement of the N-acyl group to the aromatic ring but also to demethoxylation, N-deacylation, and elimination of the methoxycarbonyl group from the molecule.

引用

页码：2488 / 2492

页数：5

共 16 条

[1]

Bellus, 1971, ADV PHOTOCHEM, V8, P109

[2]

BURKHARD N, 1979, PHOTOLYSIS CGA 48988

[3]

CHO JJ, 1981, PLANT DIS, V65, P83

[4] SYSTEMIC FUNGICIDES AND THE CONTROL OF OOMYCETES [J].