APPLICATION OF RADIOFREQUENCY DISCHARGED PLASMA PRODUCED IN CLOSED MAGNETIC NEUTRAL LINE FOR PLASMA PROCESSING

被引：68

作者：

UCHIDA, T

机构：

[1] ULVAC Japan, Ltd, Chigasaki, Kanagawa

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 1A期

关键词：

MAGNETIC NEUTRAL LINE; RF PLASMA; PLASMA PROCESSING; ETCHING; SPUTTERING; ASHING;

D O I：

10.1143/JJAP.33.L43

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new plasma processing method is presented. Use of plasma produced in a closed magnetic neutral line is essential and the merit is easily illustrated in principle with a preliminary experimental result. This method is considered to be useful for many kinds of plasma processing.

引用

页码：L43 / L44

页数：2