PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF BULK ORGANOSILICON SOLIDS USING HEXAMETHYLDISILANE PRECURSOR

Plasma polymerization of hexamethyldisilane ([CH3]3SiSi[CH3]3) at low radio frequency powers results in the formation of a fine brown powder. On prolonged exposure to air, this deposit changes in appearance to bright yellow. Freshly collected organosilicon material and its subsequent ageing have been investigated by XPS, FTIR, XRD, and solid-state NMR. A high proportion of (CH3)xSi (x = 1, 2,3) linkages and trapped reactive centers are identified in the gathered material; these species readily undergo oxidation and cross-linking on standing in the laboratory atmosphere.