IMPROVED RESOLUTION USING THE RING-SHAPED SOURCES

被引:3
作者
ASAI, S [1 ]
HANYU, I [1 ]
HIKOSAKA, K [1 ]
机构
[1] FUJITSU LABS LTD,10-1 MORINOSATO WAKAMIYA,ATSUGI 24301,JAPAN
关键词
D O I
10.1016/0167-9317(92)90022-J
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes simulated results of light amplitude and phase of a mask-projected image from a point source. It discusses the dependence on the point source location on a plane perpendicular to the optical axis. We showed that a projected image illuminated by point sources far from the optical axis was improved by the effect of interference between multiple apertures. Resolution of 0.275-mu-m lines and spaces was improved experimentally at a wavelength of 365 nm and a numerical aperture of 0.54.
引用
收藏
页码:109 / 112
页数:4
相关论文
共 4 条
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Goodman, Introduction to Fourier Optics, (1968)
[2]  
Urbach, Bernard, Modeling latent-image formation in photolithography, using the Helmholtz equation, Journal of the Optical Society of America A, 6, 9, (1989)
[3]  
Asai, Hanyu, Hikosaka, International Workshop on VLSI Process and Device Modeling (1991 VPAD), pp. 84-85, (1991)
[4]  
Fehrs, Lovering, Scruton, Proceedings of the KTI Microfabrication Seminar INTERFACE '89, (1989)