DISSOLUTION INHIBITION-TYPE PHOTORESISTS FOR DEEP-UV LITHOGRAPHY

A short introduction to photolithography with an emphasis on the classification of photoresists and the basic chemistry of conventional resists is given. The chemistry of positive type photoresists used for deep-UV lithography is reviewed and new developments in this field presented. The introduction of novel sulphonium compounds (SUCCESS) to inhibit the dissolution of poly(p-hydroxystyrene), the use of non-photoactive dissolution inhibitors together with acid generators and the protection of hydroxy groups in poly(p-hydroxystyrene) to decrease its solubility present ways of obtaining resists with high sensitivity and resolution.