THRESHOLD VOLTAGE MISMATCH IN SHORT-CHANNEL MOS-TRANSISTORS

被引:27
作者
STEYAERT, M [1 ]
BASTOS, J [1 ]
ROOVERS, R [1 ]
KINGET, P [1 ]
SANSEN, W [1 ]
GRAINDOURZE, B [1 ]
PERGOOT, A [1 ]
JANSSENS, E [1 ]
机构
[1] ALCATEL MIETEC, B-9700 OUDENAARDE, BELGIUM
关键词
CMOS INTEGRATED CIRCUITS; TRANSISTORS;
D O I
10.1049/el:19940999
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The threshold voltage matching dependency on device area is investigated for a standard 1.2 mu m CMOS technology. A deviation from the linear dependency of the threshold voltage matching on the inverse of the square root of the effective channel area is observed for transistors of 1.2 mu m channel length.
引用
收藏
页码:1546 / 1548
页数:3
相关论文
共 6 条
[1]  
ABEL CJ, 1993, 1993 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS : PROCEEDINGS, VOLS 1-4 ( ISCAS 93 ), P1401, DOI 10.1109/ISCAS.1993.393994
[2]   CHARACTERIZATION AND MODELING OF MISMATCH IN MOS-TRANSISTORS FOR PRECISION ANALOG DESIGN [J].
LAKSHMIKUMAR, KR ;
HADAWAY, RA ;
COPELAND, MA .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1986, 21 (06) :1057-1066
[3]   MATCHING PROPERTIES OF MOS-TRANSISTORS [J].
PELGROM, MJM ;
DUINMAIJER, ACJ ;
WELBERS, APG .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1989, 24 (05) :1433-1440
[4]  
Rey W., 1983, INTRO ROBUST QUASI R
[5]   RANDOM ERROR EFFECTS IN MATCHED MOS CAPACITORS AND CURRENT SOURCES [J].
SHYU, JB ;
TEMES, GC ;
KRUMMENACHER, F .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1984, 19 (06) :948-955
[6]  
TSIDIVIS YP, 1988, OPERATION MODELING M