A GENERIC COMPUTER-SIMULATION MODEL TO CHARACTERIZE PHOTOLITHOGRAPHY MANUFACTURING AREA IN AN IC FAB FACILITY

被引：3

作者：

PRASAD, K

机构：

[1] Manufacturing Systems Technology, Intel Corporation, Chandler

来源：

IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY | 1991年 / 14卷 / 03期

关键词：

D O I：

10.1109/33.83931

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Analysis of advanced manufacturing areas in any manufacturing industry requires detailed knowledge of the manufacturing processes and the material handling systems. It is essential to characterize the manufacturing area in detail before the material handling system is designed. Using state-of-the-art computer simulation tools and structured modeling methodology, generic models of the manufacturing areas, including their integration with material handling systems, could be easily built. These models, which include details of the equipment, people, and material handling systems, can be effectively used to understand the behavior of the manufacturing areas. A generic computer simulation model has been developed to characterize the photolithography area in a semiconductor FAB facility at Intel.

引用

页码：483 / 487

页数：5