PRODUCTION OF DISILANE AND SILYL STICKING COEFFICIENTS DURING PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON

被引：14

作者：

MCCAUGHEY, MJ

KUSHNER, MJ

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 17期

关键词：

D O I：

10.1063/1.101375

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1642 / 1644

页数：3

共 12 条

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