PREPARATION AND PROPERTIES OF ZRF4-BASED FLUORIDE GLASS-FILMS BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：11

作者：

FUJIURA, K

NISHIDA, Y

KOBAYASHI, K

TAKAHASHI, S

机构：

[1] NTT Opto-Electronics Laboratories, Tokai, Ibaraki

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 8B期

关键词：

ZRF4-BASED FLUORIDE GLASS; FILM; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; OPTICAL TRANSMISSION SPECTRUM;

D O I：

10.1143/JJAP.30.L1498

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

ZrF4-based binary glass films are for the first time synthesized by plasma-enhanced chemical vapor deposition (PCVD) and their optical transmission spectrum is measured from the UV to near IR region. The films are pore-free and transparent. No absorption band caused by OH or other impurities can be observed in the near IR region. Weak absorption bands attributed to defect centers, which are induced by plasma bombardment, are observed in the UV to visible region.

引用

页码：L1498 / L1500

页数：3

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