EFFECT OF ULTRAVIOLET IRRADIATION ON OPTICAL PROPERTIES OF SILICON OXIDE FILMS

被引：43

作者：

BRADFORD, AP

HASS, G

MCFARLAND, M

RITTER, E

机构：

来源：

APPLIED OPTICS | 1965年 / 4卷 / 08期

关键词：

D O I：

10.1364/AO.4.000971

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

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页码：971 / +

页数：1

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[8] PREPARATION, STRUCTURE, AND APPLICATIONS OF THIN FILMS OF SILICON MONOXIDE AND TITANIUM DIOXIDE
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