FOCUSED-ION BEAM MODIFICATION OF WAVE-GUIDE PHOTONIC DEVICES

被引:6
作者
PATTERSON, BD
MUSIL, C
SIEGWART, H
VONLANTHEN, A
机构
[1] CH-8048 Zurich
关键词
D O I
10.1016/0167-9317(94)00122-B
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Localised depressions and 50-line grating structures have been milled into the active optical waveguides of GaInAsP/InP superluminescent diodes using a 30 keV focused Ga+ beam. These features produce distinct modifications in the optical output spectra of the devices.
引用
收藏
页码:347 / 350
页数:4
相关论文
共 7 条
[1]  
Agrawal, Dutta, Long-Wavelength Semiconductor Lasers, (1986)
[2]  
DeChiaro, Damage-induced spectral perturbations in multilongitudinal-mode semiconductor lasers, Journal of Lightwave Technology, 8, (1990)
[3]  
Yamaguchi, Shimase, Haraichi, Miyauchi, Characteristics of silicon removal by fine focused gallium ion beam, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 3, (1985)
[4]  
Harriott, Scotti, Cummings, Ambrose, Micromachining of optical structures with focused ion beams, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 5, (1987)
[5]  
Takada, Yokohama, Chida, Noda, New measurement system for fault location in optical waveguide devices based on an interferometric technique, Applied Optics, 9, (1987)
[6]  
Lucas, DeChiaro, Salla, Boisrobert, Elect. Lett., 28, (1992)
[7]  
Patterson, Epler, Graf, Lehmann, Sigg, IEEE J. Quant. Elect., 30, (1994)