ARGON ENTRAPMENT IN METAL-FILMS BY DC TRIODE SPUTTERING

被引：50

作者：

LEE, WWY ^{[1
]}

OBLAS, D ^{[1
]}

机构：

[1] GTE LABS INC,WALTHAM,MA 02154

来源：

关键词：

D O I：

10.1063/1.321776

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1728 / 1732

页数：5

共 16 条

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