MODELING RADICAL-INITIATED DNA CLEAVAGE BY VINYL EPOXIDES

被引：7

作者：

BREEN, AP ^{[1
]}

MURPHY, JA ^{[1
]}

机构：

[1] UNIV NOTTINGHAM,DEPT CHEM,NOTTINGHAM NG7 2RD,ENGLAND

来源：

JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS | 1993年 / 02期

关键词：

D O I：

10.1039/c39930000191

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Allyloxy radicals, formed by addition of thio radicals to vinyl epoxides, are shown to abstract hydrogen atoms and to add to alkene pi-bonds in reactions which model the chemistry that would be required to induce DNA damage; this suggests that vinyl epoxides could have uses as radiosensitizers for treatment of resistant tumours.

引用

收藏

页码：191 / 192

页数：2

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