HETEROSTRUCTURE MULTILEVEL BINARY OPTICS

被引：8

作者：

HASMAN, E

DAVIDSON, N

FRIESEM, AA

机构：

[1] Department of Electronics, Weizmann Institute of Science, Rehovot

来源：

OPTICS LETTERS | 1991年 / 16卷 / 19期

关键词：

D O I：

10.1364/OL.16.001460

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A method for forming multilevel diffractive elements (kinoforms) that have highly accurate level heights so as to obtain high diffraction efficiencies is presented. The method, which leads to heterostructure multilevel binary optical elements, relies on conventional deposition technology, selective etching, and multimask lithography. As an illustration, a reflection multilevel element for 10.6-mu-m radiation is designed, recorded, and tested.

引用

页码：1460 / 1462

页数：3

共 8 条

[1] SINGLE PHOTOMASK, MULTILEVEL KINOFORMS IN QUARTZ AND PHOTORESIST - MANUFACTURE AND EVALUATION [J].