THE MECHANISM OF ALUMINUM ELECTRODEPOSITION FROM SOLUTIONS OF ALCL3 AND LIALH4 IN THF

被引：29

作者：

GRAEF, MWM

机构：

[1] Philips Research Lab, Eindhoven, Neth, Philips Research Lab, Eindhoven, Neth

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 05期

关键词：

ALUMINUM PLATING - Solutions - ELECTRODEPOSITION - SPECTROSCOPY; RAMAN;

D O I：

10.1149/1.2114011

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Aluminum coatings on metallic substrates can be made by electrodeposition from a nonaqueous solution such as LiAlH//4 and AlCl//3 dissolved in tetrahydrofuran. Raman spectroscopy has been used to identify the chemical constituents of the plating bath. A quantitative analysis of the equilibrium composition is given. The electrode reactions have been studied by means of chronoamperometry. The catalytic behavior of hydride and the role of neutral and ionic aluminum containing species in the faradaic and chemical processes are elucidated. The influence of variations in the composition of the solution on the properties of the plating bath is explained in terms of the mechanism of the electrodeposition process.

引用

页码：1038 / 1046

页数：9

共 40 条

[1] COMPOSITION OF COMPLEX ALUMINUM HYDRIDES AND BOROHYDRIDES, AS INFERRED FROM CONDUCTANCE, MOLECULAR ASSOCIATION, AND SPECTROSCOPIC STUDIES [J].