SIMULATIONS OF POINT-DEFECT PROPERTIES IN GRAPHITE BY A TIGHT-BINDING-FORCE MODEL

被引:50
作者
XU, CH
FU, CL
PEDRAZA, DF
机构
[1] Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
来源
PHYSICAL REVIEW B | 1993年 / 48卷 / 18期
关键词
D O I
10.1103/PhysRevB.48.13273
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Point-defect energetics and diffusion mechanisms in graphite are investigated using a semi-empirical tight-binding-force model. Possible diffusion processes associated with point-defect (i.e., vacancies and interstitials) and nondefect (i.e., atomic exchange) mechanisms are analyzed. It is found that self-diffusion in graphite in the direction parallel to the basal plane can be mediated by vacancies. However, since the calculated vacancy- and interstital-formation energies are nearly equal, it is argued that Frenkel pairs could exist as equilibrium defects. In this case, at high enough temperatures, self-diffusion parallel to the basal plane should occur by an interstitial mechanism because the migration energy of the interstitial is much lower.
引用
收藏
页码:13273 / 13279
页数:7
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