STRUCTURE AND CHEMICAL-COMPOSITION OF W-C-(CO) SPUTTERED FILMS

被引：29

作者：

CAVALEIRO, A ^{[1
]}

VIEIRA, MT ^{[1
]}

LEMPERIERE, G ^{[1
]}

机构：

[1] UNIV NANTES,INST MAT,PLASMAS & COUCHES MINES LAB,F-44035 NANTES,FRANCE

来源：

THIN SOLID FILMS | 1991年 / 197卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(91)90235-P

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

W-C-(Co) films were deposited on high speed steel substrates by non-reactive r.f. and d.c. sputtering processes from sintered WC targets with 0,6 and 15 wt.% Co. The chemical composition of the coatings was determined by X-ray photoelectron spectroscopy and energy-dispersive X-ray spectrometry techniques and their structure was studied by X-ray diffraction. Negative substrate bias determines both the chemical composition and the structure of the coatings and its influence was studied systematically in the range from 0 to 400 V. The structure of the films ranges from amorphous to some forms of tungsten carbide: WC, beta-WC1-x, alpha-W2C. The films orientation depends on the deposition procedure and substrate bias value.

引用

页码：237 / 255

页数：19