ELECTRICAL-CONDUCTIVITY AND MICROSTRUCTURE OF METAL CONTAINING A-C-H FILMS

被引：11

作者：

BENNDORF, C

BOETTGER, E

FRYDA, M

HAUBOLD, HG

KLAGES, CP

KOBERLE, H

机构：

[1] FORSCHUNGSZENTRUM JULICH GMBH,INST FESTKORPERFORSCH,W-5170 JULICH,GERMANY

[2] FRAUNHOFER INST SCHICHT & OBERFLACHENTECH,W-2000 HAMBURG 54,GERMANY

[3] MAN TECHNOL AG,TCG MT ABT,W-2000 MUNICH 80,GERMANY

来源：

SYNTHETIC METALS | 1991年 / 43卷 / 03期

关键词：

D O I：

10.1016/0379-6779(91)91743-T

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Metal containing a-C:H films are prepared by a combined PVD-CVD process. The electrical conductivity of these films is measured as a function of metal content and temperature. The varying conductivity behavior for films containing noble metals (Au and Cu) on the one hand and carbide forming metals (Nb and Ta) on the other is correlated to their microstructure.

引用

页码：4055 / 4058

页数：4

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