SMFE12 AND SMFE12NX FILMS FABRICATED BY SPUTTERING

被引：43

作者：

WANG, D

LIOU, SH

HE, P

SELLMYER, DJ

HADJIPANAYIS, GC

ZHANG, Y

机构：

[1] UNIV NEBRASKA,BEHLEN LAB PHYS,LINCOLN,NE 68588

[2] UNIV NEBRASKA,CTR MAT RES & ANAL,LINCOLN,NE 68588

[3] UNIV DELAWARE,DEPT PHYS & ASTRON,NEWARK,DE 19716

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1993年 / 124卷 / 1-2期

关键词：

D O I：

10.1016/0304-8853(93)90070-I

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

DC magnetron sputtering has been used to fabricate SmFe12 films with ThMn12 type of tetragonal structure. SmFe12Nx films were made by. heating the sample in situ in a low pressure nitrogen atmosphere. The lattice parameters are a = 8.589 angstrom, C = 4.807 angstrom for SmFe12 films and a = 8.735 angstrom, c = 4.895 angstrom for SmFe12Nx films respectively, corresponding to a volume increase of about 5.3% upon nitrogenation. A change of anisotropy and an increase of Curie temperature upon nitrogenation are observed. Aspects of crystal structure, texture and magnetic properties are reported.

引用

页码：62 / 68

页数：7

共 10 条

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AYLESWORTH KD, 1988, J APPL PHYS, V64, P5743

[2] HIGH-ENERGY PRODUCT THMN12 SM-FE-T AND SM-FE PERMANENT-MAGNETS SYNTHESIZED AS ORIENTED SPUTTERED FILMS [J].