BILAYER GROWTH IN A METALLIC SYSTEM - FE ON CU(100)

被引:61
作者
GLATZEL, H
FAUSTER, T
SCHERZER, BMU
DOSE, V
机构
[1] Max-Planck-Institut für Plasmaphysik, Euratom Association
关键词
D O I
10.1016/0039-6028(91)90637-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
During epitaxial growth of Fe on Cu(100) the normalized Auger signal of Fe was taken as a function of evaporation time. This curve shows evidence for a layer-by-layer growth mode and clearly rules out other possible growth modes. Rutherford backscattering spectrometry was used to determine thicknesses of a one- and two-layer film quantitatively with an accuracy of +/- 0.3 ML. These data together with the Auger analysis unveil a bilayer-by-bilayer growth mode for the first two bilayers.
引用
收藏
页码:58 / 64
页数:7
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