A conventional transmission electron microscope equipped with a cold field emission source (Hitachi HF-2000) was used to record coherent phase contrast from the overlap regions of convergent- beam electron diffraction (CBED) patterns in 6H SiC. The focused probe size (approximately 1 nm) was smaller than the planar spacing along the c axis (1.5 nm). When a probe was slightly defocused to illuminate several unit cells, the overlaps between adjacent CBED discs showed parallel sets of fringes, with relative shifts that were consistent with the phasing of the SiC structure factors.
