INSERTION REACTIONS OF MONOVALENT SILICON - A NONVANISHING BARRIER FOR THE SILYLIDYNE PLUS HYDROGEN REACTION SIH+H-2

被引:15
作者
GORDON, MS
XIE, YM
YAMAGUCHI, Y
GREV, RS
SCHAEFER, HF
机构
[1] UNIV GEORGIA,CTR COMPUTAT QUANTUM CHEM,ATHENS,GA 30602
[2] IOWA STATE UNIV SCI & TECHNOL,DEPT CHEM,AMES,IA 50011
关键词
D O I
10.1021/ja00057a041
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Ab initio quantum mechanical methods have been applied to the SiH (X 2PI) insertion into the H-2 molecule. The transition state has no elements of symmetry. The classical barrier height is predicted to be 5.6 +/- 1 kcal/mol. The barrier is qualitatively consistent with an estimate from Jasinski's experimental reaction rates, which are much slower than those observed for the related CH + H-2, SiH + SiH4, and SiH2 + H-2 reactions.
引用
收藏
页码:1503 / 1507
页数:5
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