MAGNETRON SPUTTER DEPOSITION OF BORON AND BORON-CARBIDE

The fabrication of X-ray optical coatings with greater reflectivity required the development of sputter deposition processes for boron and boron carbide. The use of high density boron and boron carbide (B4C) and a vacuum-brazed target design was required to achieve the required sputter process stability and resistance to the thermal stress created by high rate sputtering. Our results include a description of the target fabrication procedures and sputter process parameters necessary to fabricate B4C and boron modulated thin film structures.