ALLERGIC PHOTOCONTACT DERMATITIS DUE TO SUPROFEN - PHOTOPATCH TESTING AND CROSS-REACTION STUDY

被引:38
作者
KURUMAJI, Y
OHSHIRO, Y
MIYAMOTO, C
KEONG, CH
KATOH, T
NISHIOKA, K
机构
[1] Department of Dermatology, School of Medicine, Tokyo Medical and Dental University, Tokyo, 113, 1-5-45 Yushima, Bunkyo-ku
关键词
SUPROFEN; SUTOPROFEN; PHOTOCONTACT DERMATITIS; PHOTOALLERGY; PHOTOPATCH TEST; TIAPROFENIC ACID; KETOPROFEN; NONSTEROIDAL ANTIINFLAMMATORY DRUGS; CROSS-SENSITIVITY; MEDICAMENTS;
D O I
10.1111/j.1600-0536.1991.tb01848.x
中图分类号
R392 [医学免疫学];
学科分类号
100102 ;
摘要
We report 5 cases of photocontact dermatitis due to suprofen, a nonsteroidal anti-inflammatory drug introduced to the Japanese market in 1989, and available as a 1% ointment. The patients developed pruritic eczematous lesions after applying the ointment for from 2 weeks to 3 months. All 5 patients reacted positively to photopatch testing with ultraviolet A (UVA) and suprofen down to 0.1-0.01% pet., and 3 patients showed positive reactions with ultraviolet B (UVB) and suprofen down to 1.0-0.1%. Moreover, all patients showed a cross-reaction with tiaprofenic acid, which has a very similar chemical structure to suprofen. However, there was no cross-reaction between suprofen and ketoprofen. Prescribers should be aware of the existence of photocontact sensitivity due to these drugs.
引用
收藏
页码:218 / 223
页数:6
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