SURFACE-TOPOGRAPHY DEVELOPMENT ON TEFLON UNDER KEV XE ATOM BOMBARDMENT

被引：22

作者：

MICHAEL, R ^{[1
]}

STULIK, D ^{[1
]}

机构：

[1] WASHINGTON STATE UNIV,DEPT CHEM,PULLMAN,WA 99164

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 04期

关键词：

D O I：

10.1116/1.573778

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1861 / 1865

页数：5

共 31 条

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