MICROSTRUCTURE AND TEXTURE FORMATION IN VACUUM-DEPOSITED SILVER FILMS

The role of the recrystallization in the processes of microstructure and texture formation of silver films is compared for films: 1) deposited at high substrate temperatures (up to 720 K) and slowly cooled or quenched to room temperature; 2) deposited at room temperature and annealed at high temperatures. The grain growth distribution curves and the texture perfection are analysed. It is shown that the recrystallization processes taking place both during the slow cooling and during the annealing of the films lead to a formation of identical film structure with lower degree of texture perfection than in the case of quenched films.