THERMAL PLASMA PRODUCTION OF FUMED SILICA - THE EFFECT OF QUENCH CONDITIONS ON THICKENING AND THIXOTROPIC ABILITY

被引：7

作者：

ADDONA, T ^{[1
]}

MUNZ, RJ ^{[1
]}

机构：

[1] MCGILL UNIV,DEPT CHEM ENGN,MONTREAL H3A 2A7,QUEBEC,CANADA

来源：

CANADIAN JOURNAL OF CHEMICAL ENGINEERING | 1994年 / 72卷 / 03期

关键词：

FUMED SILICA; THERMAL PLASMA; QUENCH CONDITIONS; THICKENING AND THIXOTROPIC ABILITY;

D O I：

10.1002/cjce.5450720313

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

The effect of quench conditions on the thickening and thixotropic ability of fumed silica was studied. The powder was generated by rapidly quenching a vapour stream containing SiO(g) with steam. Silicon monoxide vapour was produced by decomposing quartz in a transferred arc reactor using an Ar/NH3 thermal plasma. The parameters investigated included pre-quench temperature (1100 - 2100 K), and supersaturation ratio (1 - 10(7), quench rate (17000 - 75000 K/s), and quench stoichiometry (27 - 84), which was defined as the molar ratio of steam to SiO. The thickening and thixotropic ability of the powders increased with increasing quench rate and decreasing pre-quench supersaturation. This was due to an increase in specific surface area. Use of large H2O/SiO ratios caused a high degree of surface hydroxylation.

引用

页码：476 / 483

页数：8

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