POLY(NORMAL-BUTYL ALPHA-CYANOACRYLATE) - A HIGHLY SENSITIVE AND HIGH CONTRAST RESIST FOR ELECTRON-BEAM AND X-RAY-LITHOGRAPHY

被引：3

作者：

ERANIAN, A

DATAMANTI, E

DUBOIS, JC

SERRE, B

SCHUE, F

MONTGINOUL, C

GIRAL, L

机构：

[1] UNIV MONTPELLIER 2,CHIM MACROMOLEC LAB,PL E BATAILLON,F-34060 MONTPELLIER,FRANCE

[2] THOMSON CSF,CENT RES LAB,F-91401 ORSAY,FRANCE

[3] UNIV MONTPELLIER 2,CHIM ORGAN STRUCT LAB,F-34060 MONTPELLIER,FRANCE

来源：

BRITISH POLYMER JOURNAL | 1987年 / 19卷 / 3-4期

关键词：

D O I：

10.1002/pi.4980190319

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：353 / 359

页数：7

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[9] SYNTHESIS AND DEGRADATION OF POLY(ALKYL ALPHA-CYANOACRYLATES) [J].

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