NUCLEATION AND GROWTH-MORPHOLOGY IN HETEROEPITAXY OF CAF2 ON SI(111) - A STUDY WITH SCANNING-TUNNELING-MICROSCOPY

被引:10
作者
SUMIYA, T
MIURA, T
TANAKA, S
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1995年 / 34卷 / 10B期
关键词
SCANNING TUNNELING MICROSCOPY; SILICON; CALCIUM FLUORIDE; HETEROEPITAXY;
D O I
10.1143/JJAP.34.L1383
中图分类号
O59 [应用物理学];
学科分类号
摘要
Scanning tunneling microscopy (STM) was used to investigate nucleation and growth phenomena in the heteroepitaxy of calcium fluoride (CaF2) on a Si(111) surface. CaF2 was evaporated at room temperature on Si(111), and annealed to about 450 degrees C. Subsequently, characteristically, shaped islands, with steps arranged in the [1 (1) over bar 0] direction, were observed both on a terrace and a step edge of Si(111). After annealing this surface to about 600 degrees C, STM images clearly showed that these islands underwent a structural transformation to well-ordered heteroepitaxial layers which consisted of rows running along the [1 (1) over bar 0] direction and grew from Si step edges. These findings show that at a high temperature the preferential nucleation sites are distributed on the Si step edges and that CaF2 molecules have sufficient surface diffusion length to form the heteroepitaxial layers at the step edges.
引用
收藏
页码:L1383 / L1385
页数:3
相关论文
共 14 条
[1]   SCANNING TUNNELING MICROSCOPY OF INSULATORS - CAF2 EPITAXY ON SI(111) [J].
AVOURIS, P ;
WOLKOW, R .
APPLIED PHYSICS LETTERS, 1989, 55 (11) :1074-1076
[2]   LATTICE AND THERMAL MISFIT DISLOCATIONS IN EPITAXIAL CAF2/SI(111) AND BAF2-CAF2/SI(111) STRUCTURES [J].
BLUNIER, S ;
ZOGG, H ;
MAISSEN, C ;
TIWARI, AN ;
OVERNEY, RM ;
HAEFKE, H ;
BUFFAT, PA ;
KOSTORZ, G .
PHYSICAL REVIEW LETTERS, 1992, 68 (24) :3599-3602
[3]   GROWTH-KINETICS OF CAF2/SI(111) HETEROEPITAXY - AN X-RAY PHOTOELECTRON DIFFRACTION STUDY [J].
DENLINGER, JD ;
ROTENBERG, E ;
HESSINGER, U ;
LESKOVAR, M ;
OLMSTEAD, MA .
PHYSICAL REVIEW B, 1995, 51 (08) :5352-5365
[4]   2-DIMENSIONAL STRUCTURAL MODULATION IN EPITAXIAL CAF2 OVERLAYERS ON SI(111) [J].
HUANG, KG ;
ZEGENHAGEN, J ;
PHILLIPS, JM ;
PATEL, JR .
PHYSICAL REVIEW LETTERS, 1994, 72 (15) :2430-2433
[5]   SURFACE RECONSTRUCTION AND THE NUCLEATION OF PALLADIUM SILICIDE ON SI(111) [J].
KOHLER, UK ;
DEMUTH, JE ;
HAMERS, RJ .
PHYSICAL REVIEW LETTERS, 1988, 60 (24) :2499-2502
[6]   EPITAXIAL-GROWTH MECHANISMS AND STRUCTURE OF CAF2/SI(111) [J].
LUCAS, CA ;
LORETTO, D ;
WONG, GCL .
PHYSICAL REVIEW B, 1994, 50 (19) :14340-14353
[7]   MECHANISM OF EPITAXIAL-GROWTH OF MONOLAYER CAF ON SI(111)-(7X7) [J].
NAKAYAMA, T ;
KATAYAMA, M ;
SELVA, G ;
AONO, M .
PHYSICAL REVIEW LETTERS, 1994, 72 (11) :1718-1721
[8]   INITIAL FORMATION OF THE INTERFACE BETWEEN A POLAR INSULATOR AND A NONPOLAR SEMICONDUCTOR - CAF2 ON SI(111) [J].
OLMSTEAD, MA ;
UHRBERG, RIG ;
BRINGANS, RD ;
BACHRACH, RZ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (04) :1123-1127
[9]   ELECTRONIC-STRUCTURE OF THE CAF2/SI(111) INTERFACE [J].
RIEGER, D ;
HIMPSEL, FJ ;
KARLSSON, UO ;
MCFEELY, FR ;
MORAR, JF ;
YARMOFF, JA .
PHYSICAL REVIEW B, 1986, 34 (10) :7295-7306
[10]   SURFACE CORE-LEVEL SHIFTS IN CAF2-ON-SI(111) FILMS - EXPERIMENT AND THEORY [J].
ROTENBERG, E ;
DENLINGER, JD ;
HESSINGER, U ;
LESKOVAR, M ;
OLMSTEAD, MA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (04) :1444-1448