FULLY SELF-CONSISTENT CALCULATION OF THE ELECTRONIC-STRUCTURE OF N-TYPE INAS ACCUMULATION LAYERS

被引:15
作者
ZHANG, AZ [1 ]
SLINKMAN, J [1 ]
DOEZEMA, RE [1 ]
机构
[1] IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452
来源
PHYSICAL REVIEW B | 1991年 / 44卷 / 19期
关键词
D O I
10.1103/PhysRevB.44.10752
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The screening of an external electric field at the surface of a degenerate semiconductor is modified in narrow-band-gap materials due to "motional binding," where the confinement potential for surface-bound states depends on electron motion along the surface. A self-consistent calculation is presented that includes motional binding and treats both bound and mobile charge on the same footing. The calculation is applied to accumulation layers on n-type InAs and very good agreement is obtained with existing Shubnikov-de Haas data. The calculation is also used to predict intersubband spacings under conditions of motional binding.
引用
收藏
页码:10752 / 10759
页数:8
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