ACTIVATED DISSOCIATION OF OXYGEN ON CU(110)

被引：38

作者：

PUDNEY, P ^{[1
]}

BOWKER, M ^{[1
]}

机构：

[1] UNIV LIVERPOOL,DEPT CHEM,LEVERHULME CTR INNOVAT CATALYSIS,LIVERPOOL L69 3BX,ENGLAND

来源：

CHEMICAL PHYSICS LETTERS | 1990年 / 171卷 / 04期

关键词：

D O I：

10.1016/0009-2614(90)85380-U

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Oxygen adsorption on Cu(110) has been studied using a thermal molecular-beam system. The sticking probability (S) is independent of substrate temperature above 220 K but depends strongly on beam temperature, showing the adsorption to be directly activated from the gas phase by 3kj mol-1. However, at low substrate temperatures there is also evidence of the involvement of an accommodated, molecularly chemisorbed species in the dissociation process. The adsorption scales with total energy of the incoming molecule and so eitheir the potential surface appears isotropic in space, or there is a rather tortuos entrance channel to reach the barrier, which exists between unionised (physisorbed) oxygen and O-2 at the surface. © 1990.

引用

页码：373 / 376

页数：4

共 18 条

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