MAGNETIC AND STRUCTURAL CHARACTERISTICS OF FE/AL MULTILAYERS DEPOSITED BY ION-BEAM SPUTTERING WITH KR

被引：16

作者：

HAMAGUCHI, T

AIDA, H

NAKAGAWA, S

NAOE, M

机构：

[1] Department of Physical Electronics, Tokyo Institute of Technology, Meguro-ku, Tokyo 152

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 73卷 / 10期

关键词：

D O I：

10.1063/1.352627

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Fe/Al multilayers have been prepared by the ion beam sputtering method with use of Ar and Kr as the working gas. Sputtering by Kr ion beam deposited the multilayer with better crystallinity, smaller interdiffusion between layers, and lower electrical resistivity than sputtering by Ar ion beam. Multilayers with thicknesses of Fe and Al layers of 50-120 angstrom and 15-20 angstrom, respectively, possessed excellent soft magnetism. Such soft magnetism seems to be related, in part, to the fine granulation in Fe layers.

引用

页码：6444 / 6446

页数：3

共 8 条

[1] SHORT-PERIOD AND LONG PERIOD OSCILLATIONS IN THE EXCHANGE COUPLING OF FE ACROSS EPITAXIALLY GROWN AL-INTERLAYERS AND AU-INTERLAYERS [J].